10

Patterning of Ru electrode in O2/Cl2 gas using reactive ion etcher

Year:
2003
Language:
english
File:
PDF, 340 KB
english, 2003
14

Patterning of W/WNx/poly-Si gate electrode using Cl2/O2 plasmas

Year:
2003
Language:
english
File:
PDF, 684 KB
english, 2003
20

A study on the Pt electrode etching for 0.15 μm technologies

Year:
2003
Language:
english
File:
PDF, 1.05 MB
english, 2003
36

High-rate Ru electrode etching using O2/Cl2 inductively coupled plasma

Year:
2003
Language:
english
File:
PDF, 571 KB
english, 2003